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SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 13 September 2004)] 24th Annual BACUS Symposium on Photomask Technology - Calibrating grayscale direct write bimetallic photomasks to create 3D photoresist structures
Tu, Yuqiang, Chapman, Glenn H., Dykes, James, Poon, David, Choo, Chinheng, Peng, Jun, Staud, Wolfgang, Weed, J. TracyVolume:
5567
Year:
2004
Language:
english
DOI:
10.1117/12.569405
File:
PDF, 341 KB
english, 2004