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SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Advances in Resist Technology and Processing IX - Photoresist formulation optimization through the use of statistical design of experimentation
Bell, Ken L., Acuna, Nadine A., Dixit, Sunit S., Lazarus, Richard M., Talor, Jr., George, Novembre, Anthony E.Volume:
1672
Year:
1992
Language:
english
DOI:
10.1117/12.59770
File:
PDF, 626 KB
english, 1992