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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - High transmission mask technology for 45nm node imaging
Conley, Will, Smith, Bruce W., Cangemi, Mike, Kasprowicz, Bryan S., Lassiter, Matt, Litt, Lloyd C., Cangemi, Marc, Cottle, Rand, Smith, Mark, Wu, Wei, Cobb, Jonathan, Carter, Rusty, Ham, Young-mog, LuVolume:
5754
Year:
2005
Language:
english
DOI:
10.1117/12.601584
File:
PDF, 144 KB
english, 2005