SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Interaction and balance of mask write time and design RET strategies
Zhang, Yuan, Komuro, Masanori, Gray, Rick, Nakagawa, O. S., Gupta, Puneet, Kamberian, Henry, Xiao, Guangming, Cottle, Rand, Progler, ChrisVolume:
5853
Year:
2005
Language:
english
DOI:
10.1117/12.617146
File:
PDF, 109 KB
english, 2005