SPIE Proceedings [SPIE Microelectronics, MEMS, and Nanotechnology - Brisbane, Australia (Sunday 11 December 2005)] Microelectronics: Design, Technology, and Packaging II - Local-strain effect of the SiN/Si stacking and nanoscale triple gate Si/SiGe MOS transistor
Chang, C. H., Chou, C. Y., Han, C. N., Peng, C. T., Chiang, Kuo-Ning, Hariz, Alex J.Volume:
6035
Year:
2006
Language:
english
DOI:
10.1117/12.638567
File:
PDF, 379 KB
english, 2006