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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - Sub-100-nm trackwidth development by e-beam lithography for advanced magnetic recording heads
Chang, Jei-Wei, Lercel, Michael J., Chen, Chao-PengVolume:
6151
Year:
2006
Language:
english
DOI:
10.1117/12.654547
File:
PDF, 631 KB
english, 2006