SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Dissolution fundamentals of 193-nm methacrylate based photoresists
Rao, Ashwin, Lin, Qinghuang, Kang, Shuhui, Vogt, Bryan D., Prabhu, Vivek M., Lin, Eric K., Wu, Wen-Li, Turnquest, Karen, Hinsberg, William D.Volume:
6153
Year:
2006
Language:
english
DOI:
10.1117/12.656540
File:
PDF, 252 KB
english, 2006