SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - TaN-based EUV mask absorber etch study
Du, Yan, Hoga, Morihisa, Choi, Chang Ju, Zhang, Guojing, Park, Seh-Jin, Yan, Pei-Yang, Baik, Ki-HoVolume:
6283
Year:
2006
Language:
english
DOI:
10.1117/12.681832
File:
PDF, 355 KB
english, 2006