SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Mo/Si multilayers with enhanced TiO 2 - and RuO 2 -capping layers
Yulin, Sergiy, Schellenberg, Frank M., Benoit, Nicolas, Feigl, Torsten, Kaiser, Norbert, Fang, Ming, Chandhok, ManishVolume:
6921
Year:
2008
Language:
english
DOI:
10.1117/12.772653
File:
PDF, 1.03 MB
english, 2008