SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - OPC model enhancement using parameter sensitivity methodology
Ward, Brian S., Horiuchi, Toshiyuki, Drapeau, MartinVolume:
7028
Year:
2008
Language:
english
DOI:
10.1117/12.793030
File:
PDF, 393 KB
english, 2008