SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - Methodology of flare modeling and compensation in EUVL
Kim, Insung, Chen, Alek C., Lin, Burn, Kang, Hoyoung, Park, Changmin, Yen, Anthony, Park, Joo-On, Lee, Jeonghoon, Park, Jinhong, Goo, Doohoon, Yeo, Jeongho, Choi, Seong-Woon, Han, WoosungVolume:
7140
Year:
2008
Language:
english
DOI:
10.1117/12.804673
File:
PDF, 3.66 MB
english, 2008