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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Chemically amplified hybrid resist platform for i-line applications
Toukhy, Medhat, Henderson, Clifford L., Paunescu, Margareta, Bogusz, Zachary, Pawlowski, GeorgVolume:
7273
Year:
2009
Language:
english
DOI:
10.1117/12.816044
File:
PDF, 890 KB
english, 2009