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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Design for Manufacturability through Design-Process Integration III - Hotspot detection and design recommendation using silicon calibrated CMP model
Hui, Colin, Singh, Vivek K., Rieger, Michael L., Wang, Xian Bin, Huang, Haigou, Katakamsetty, Ushasree, Economikos, Laertis, Fayaz, Mohammed, Greco, Stephen, Hua, Xiang, Jayathi, Subramanian, Yuan, ChVolume:
7275
Year:
2009
Language:
english
DOI:
10.1117/12.816556
File:
PDF, 2.50 MB
english, 2009