SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - Implementation strategy of wafer-plane and aerial-plane inspection for advanced mask manufacture
Kim, Won-Sun, Hosono, Kunihiro, Chung, Dong-Hoon, Jeon, Chan-Uk, Cho, HanKu, Huang, William, Miller, John, Inderhees, Gregg, Pinto, Becky, Hur, Jiuk, Park, Kihun, Han, JayVolume:
7379
Year:
2009
Language:
english
DOI:
10.1117/12.824289
File:
PDF, 4.96 MB
english, 2009