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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Process optimization consideration for 193nm developable bottom anti-reflective coatings (DBARCs)
Kudo, Takanori, Allen, Robert D., Chakrapani, Srinivasan, Dioses, Alberto, Ng, Edward, Antonio, Charito, Parthasarathy, Deepa, Collett, Richard, Neisser, Mark, Padmanaban, MunirathnaVolume:
7639
Year:
2010
Language:
english
DOI:
10.1117/12.846313
File:
PDF, 1.55 MB
english, 2010