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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Simplified double patterning process with non-topcoat self-freezing resist
Fujisawa, Tomohisa, Allen, Robert D., Anno, Yusuke, Hori, Masafumi, Wakamatsu, Goji, Mita, Michihiro, Ito, Koji, Tanaka, Hiromitsu, Hoshiko, Kenji, Shioya, Takeo, Goto, Kentaro, Ogawa, Yoshifumi, TakiVolume:
7639
Year:
2010
Language:
english
DOI:
10.1117/12.846493
File:
PDF, 693 KB
english, 2010