SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Multi-technique study of carbon contamination and cleaning of Mo/Si mirrors exposed to pulsed EUV radiation
La Fontaine, Bruno M., Schürmann, Mark, Yulin, Sergiy, Nesterenko, Viatcheslav, Feigl, Torsten, Kaiser, Norbert, Tkachenko, Boris, Schürmann, Max C.Volume:
7636
Year:
2010
Language:
english
DOI:
10.1117/12.848197
File:
PDF, 351 KB
english, 2010