SPIE Proceedings [SPIE 28th European Mask and Lithography Conference (EMLC 2012) - Dresden, Germany (Tuesday 17 January 2012)] 28th European Mask and Lithography Conference - Impact of reticle absorber on the imaging properties in ArFi lithography
Finders, Jo, Mouraille, O., Bouma, A., Ngai, A., Grim, K., van Praagh, J., Toma, C., Miyazaki, J., Higuchi, M., Kojima, Y., Connolly, B., Englard, I., Cohen, Y., Mangan, S., Ben Yishai, Michael, JulliVolume:
8352
Year:
2012
Language:
english
DOI:
10.1117/12.918018
File:
PDF, 758 KB
english, 2012