SPIE Proceedings [SPIE 1985 Microlithography Conferences - Santa Clara (Monday 11 March 1985)] Optical Microlithography IV - A New Aluminosilicate Glass Substrate For Photomasks
Kokubu, Y., Shinkai, N., Haranoh, T., Stover, Harry L.Volume:
538
Year:
1985
Language:
english
DOI:
10.1117/12.947771
File:
PDF, 10.87 MB
english, 1985