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SPIE Proceedings [SPIE 1989 Microelectronic Intergrated Processing Conferences - Santa Clara (Tuesday 10 October 1989)] Dry Processing for Submicrometer Lithography - Optimization Of A Highly Selective Nitride/Oxide Rie In A Batch Etching Machine By Statistical Analysis
Hause, F. N., Stocker, H. J., Lynch, R. O., Bondur, James A., Reinberg, Alan R.Volume:
1185
Year:
1990
Language:
english
DOI:
10.1117/12.978061
File:
PDF, 877 KB
english, 1990