SPIE Proceedings [SPIE 1989 Microelectronic Intergrated Processing Conferences - Santa Clara (Tuesday 10 October 1989)] Dry Processing for Submicrometer Lithography - Radical and Molecular Product Concentration Measurements in CF4 RF Plasmas by Infrared Tunable Diode Laser Absorption RF plasmas by infrared tunable diode laser absorption
Wormhoudt, J., Bondur, James A., Reinberg, Alan R.Volume:
1185
Year:
1990
Language:
english
DOI:
10.1117/12.978064
File:
PDF, 758 KB
english, 1990