Errata: Non-delta-chrome optical proximity correction...

Journal of Micro/Nanolithography MEMS and MOEMS 2011 / 10 Vol. 10; Iss. 4

Errata: Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects

Ng, Philip C. W.
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Volume:
10
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.3647513
Date:
October, 2011
File:
PDF, 44 KB
english, 2011
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