Electron multibeam technology for mask and wafer writing at...

Electron multibeam technology for mask and wafer writing at 0.1 nm address grid

Platzgummer, Elmar, Klein, Christof, Loeschner, Hans
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Volume:
12
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.jmm.12.3.031108
Date:
August, 2013
File:
PDF, 6.54 MB
english, 2013
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