SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Integrated Circuit Metrology, Inspection, and Process Control VII - Matching of multiple-wafer steppers for 0.35-μm lithography using advanced optimization schemes
van den Brink, Martin A., de Mol, Chris G. M., Stoeldraijer, Judon M. D., Postek, Michael T.Volume:
1926
Year:
1993
Language:
english
DOI:
10.1117/12.148937
File:
PDF, 612 KB
english, 1993