SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Integrated Circuit Metrology, Inspection, and Process Control IX - Reaching for 0.25 μm with current available tool set
Thane, Nathan S., Savage II, Ronald I., Stark, David R., Hollifield, Jr., Larry D., Bennett, Marylyn H.Volume:
2439
Year:
1995
Language:
english
DOI:
10.1117/12.209231
File:
PDF, 972 KB
english, 1995