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SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Integrated Circuit Metrology, Inspection, and Process Control IX - Effect of numerical aperture and partial coherence on i-line swing curve amplitude at sub-half-micrometer resolution
Martin, Brian, Arthur, Graham G., Bennett, Marylyn H.Volume:
2439
Year:
1995
Language:
english
DOI:
10.1117/12.209232
File:
PDF, 393 KB
english, 1995