![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Optical Microlithography XXIX - Investigation of systematic CD distribution error on intrafield
Erdmann, Andreas, Kye, Jongwook, Kim, Keunjun, Kim, Daewoo, Kang, Jung-Hyun, Jeong, Inseok, Lee, Sung Koo, Kim, Hyeong-SooVolume:
9780
Year:
2016
Language:
english
DOI:
10.1117/12.2219562
File:
PDF, 2.09 MB
english, 2016