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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Optical Microlithography XXIX - Improvement of unbalanced illumination induced telecentricity within the exposure slit
Erdmann, Andreas, Kye, Jongwook, Jang, Jong Hoon, Lee, ByeongSoo, Kang, Young Seog, Chang, Chansam, Kong, Jeong-Heung, Kim, Young Ha, Bouman, Wim, de Graaf, Roelof, Weichselbaum, Stefan, Droste, RichaVolume:
9780
Year:
2016
Language:
english
DOI:
10.1117/12.2220588
File:
PDF, 321 KB
english, 2016