SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Optical Microlithography IX - Characterization of resists and antireflective coatings by spectroscopic ellipsometry in the UV and deep-UV range
Boher, Pierre, Piel, Jean-Philippe, Defranoux, Christophe, Stehle, Jean-Louis P., Hennet, Louis, Fuller, Gene E.Volume:
2726
Year:
1996
Language:
english
DOI:
10.1117/12.240988
File:
PDF, 780 KB
english, 1996