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SPIE Proceedings [SPIE 16th Annual BACUS Symposium on Photomask Technology and Management - Redwood City, CA (Wednesday 18 September 1996)] 16th Annual BACUS Symposium on Photomask Technology and Management - Advanced model for resist heating effect simulation in electron-beam lithography
Babin, Sergey V., Kozunov, V. V., Kuzmin, Igor Y., Shelden, Gilbert V., Reynolds, James A.Volume:
2884
Year:
1996
Language:
english
DOI:
10.1117/12.262844
File:
PDF, 306 KB
english, 1996