SPIE Proceedings [SPIE 17th Annual BACUS Photomask Technology and Management - Redwood City, CA (Wednesday 17 September 1997)] 17th Annual BACUS Symposium on Photomask Technology and Management - Evaluation of process capabilities for 50 keV with rectangular-shaped beam using computer simulation
Cha, Byung-Cheol, Kim, Yoo-Hyon, Choi, Seong-Woon, Yu, Yong H., Sohn, Jung-Min, Reynolds, James A., Grenon, Brian J.Volume:
3236
Year:
1998
Language:
english
DOI:
10.1117/12.301198
File:
PDF, 379 KB
english, 1998