SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Sunday 20 September 1998)] Process, Equipment, and Materials Control in Integrated Circuit Manufacturing IV - Real-time spectroscopic reflectometer for end-point detection on multichamber deposition processes
Boher, Pierre, Noygues, Sebastien, Stehle, Jean-Louis P., Toprac, Anthony J., Dang, KimVolume:
3507
Year:
1998
Language:
english
DOI:
10.1117/12.324348
File:
PDF, 1.86 MB
english, 1998