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SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Sunday 20 September 1998)] Process, Equipment, and Materials Control in Integrated Circuit Manufacturing IV - Multivariate run-to-run control of arm-to-arm variations in chemical mechanical planarization
Campbell, W. J., Raeder, Chris, Wenner, Valerie, Edgar, Thomas F., Toprac, Anthony J., Dang, KimVolume:
3507
Year:
1998
Language:
english
DOI:
10.1117/12.324360
File:
PDF, 782 KB
english, 1998