SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Emerging Lithographic Technologies III - Characteristics of sputtered TaX absorbers for x-ray mask
Sheu, Jeng Tzong, Chu, A., Ding, J. H., Su, Shyang, Vladimirsky, YuliVolume:
3676
Year:
1999
Language:
english
DOI:
10.1117/12.351128
File:
PDF, 370 KB
english, 1999