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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - Silicon-oxynitride films prepared for 157-nm attenuated phase-shifting masks
Chen, Hsuen-Li, Wang, Lon A., Yeh, L. S., Lai, F. D., Van den Hove, LucVolume:
3679
Year:
1999
Language:
english
DOI:
10.1117/12.354314
File:
PDF, 688 KB
english, 1999