SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - Extending the limits of i-line lithography for via layers and minimization of dense-iso bias
Subramanian, Ramkumar, Spence, Chris A., Capodieci, Luigi, Werner, Thomas, Gallardo, Ernesto, Van den Hove, LucVolume:
3679
Year:
1999
Language:
english
DOI:
10.1117/12.354409
File:
PDF, 1.90 MB
english, 1999