SPIE Proceedings [SPIE International Symposium on Microelectronics and Assembly - Singapore, Singapore (Monday 27 November 2000)] Advanced Microelectronic Processing Techniques - Epitaxial CoSi2 on Si(100) by oxide-mediated epitaxy
Kleinschmit, Mark W., Yeadon, Mark, Gibson, J. M., Harrison, H. Barry, Wee, Andrew T. S., Gupta, SubhashVolume:
4227
Year:
2000
Language:
english
DOI:
10.1117/12.405377
File:
PDF, 218 KB
english, 2000