SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - 100-nm node lithography with KrF?
Fritze, Michael, Tyrrell, Brian, Astolfi, David K., Yost, Donna, Davis, Paul, Wheeler, Bruce, Mallen, Renee D., Jarmolowicz, J., Cann, Susan G., Liu, Hua-Yu, Ma, M., Chan, David Y., Rhyins, Peter D.,Volume:
4346
Year:
2001
Language:
english
DOI:
10.1117/12.435719
File:
PDF, 1.61 MB
english, 2001