SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Emerging Lithographic Technologies V - Damage-resistant and low stress EUV multilayer mirrors
Yulin, Sergey A., Kuhlmann, Thomas, Feigl, Torsten, Kaiser, Norbert, Dobisz, Elizabeth A.Volume:
4343
Year:
2001
Language:
english
DOI:
10.1117/12.436715
File:
PDF, 607 KB
english, 2001