SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA...

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SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA (Wednesday 3 October 2001)] 21st Annual BACUS Symposium on Photomask Technology - Verification of the effect of mask bias on the mask error enhancement factor of contact holes

Reilly, Michael T., Robertson, Stewart A., Parker, Colin R., Kang, Doris, Dusa, Mircea V., MacDonald, Susan S., West, Craig A., Dao, Giang T., Grenon, Brian J.
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Volume:
4562
Year:
2002
Language:
english
DOI:
10.1117/12.443111
File:
PDF, 307 KB
english, 2002
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