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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Aliphatic platforms for the design of 157-nm chemically amplified resists
Ito, Hiroshi, Truong, Hoa D., Okazaki, Masaki, Miller, Dolores C., Fender, Nicolette, Breyta, Gregory, Brock, Phillip J., Wallraff, Gregory M., Larson, Carl E., Allen, Robert D., Fedynyshyn, TheodoreVolume:
4690
Year:
2002
Language:
english
DOI:
10.1117/12.474223
File:
PDF, 391 KB
english, 2002