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SPIE Proceedings [SPIE Design, Process Integration, and Characterization for Microelectronics - Santa Clara, CA (Wednesday 6 March 2002)] Design, Process Integration, and Characterization for Microelectronics - Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination
Petersen, John S., Conley, Will, Roman, Bernard J., Litt, Lloyd C., Lucas, Kevin, Wu, Wei, Van Den Broeke, Douglas J., Chen, J. Fung, Laidig, Thomas L., Wampler, Kurt E., Gerold, David J., Maslow, MarVolume:
4692
Year:
2002
Language:
english
DOI:
10.1117/12.475692
File:
PDF, 517 KB
english, 2002