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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Critical dimension (CD) control in 157-nm lithography
Hori, Shinya, Yoshihara, Kosuke, Kyoda, Hideharu, Matsui, Hidefumi, Furukawa, Takamitsu, Miyoshi, Seiro, Kawaguchi, Etsurou, Itani, Toshiro, Fedynyshyn, Theodore H.Volume:
5039
Year:
2003
Language:
english
DOI:
10.1117/12.485057
File:
PDF, 344 KB
english, 2003