![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - Process window monitoring: an emerging requirement for efficient low-k1 lithography
Chiua, S. S., Chu, Yao-Chang, Hsieh, J. C., Mo, Wang Pen, Wu, C. M., Teng, Thomas, Slessor, Mike D., Yen, AnthonyVolume:
5040
Year:
2003
Language:
english
DOI:
10.1117/12.485450
File:
PDF, 286 KB
english, 2003