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SPIE Proceedings [SPIE Lightmetry 2002 - Warsaw, Poland (Tuesday 14 May 2002)] Lightmetry 2002: Metrology and Testing Techniques Using Light - Effects of stress annealing on the index of refraction of SiO2 layers in MOS devices
Rzodkiewicz, Witold, Przewlocki, Henryk M., Pluta, Maksymilian, Szyjer, MariuszVolume:
5064
Year:
2003
Language:
english
DOI:
10.1117/12.501538
File:
PDF, 165 KB
english, 2003