SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Extension of ArF lithography for poly gate patterning of 65-nm generation and beyond
Hsu, Shu-Hao, Smith, Bruce W., Fang, Shu-Ping, Huang, I. Hsuing, Lin, Benjamin S., Hung, Kuei-ChunVolume:
5377
Year:
2004
Language:
english
DOI:
10.1117/12.534641
File:
PDF, 255 KB
english, 2004