SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Strong improvement of critical parameters of CaF 2 lens blanks for 193-nm and 157-nm lithography
Grabosch, Guenter, Smith, Bruce W., Parthier, Lutz, Kruell, Peter, Knapp, KonradVolume:
5377
Year:
2004
Language:
english
DOI:
10.1117/12.536310
File:
PDF, 130 KB
english, 2004