SPIE Proceedings [SPIE Dry Etch Technology - San J, United States (Monday 9 September 1991)] Dry Etch Technology - Wafer charging in different types of plasma etchers
Namura, Takashi, Uchida, Hirofumi, Okada, Hiroyuki, Koshio, Atsushi, Nakagawa, Satoshi, Todokoro, Yoshihiro, Inoue, Morio, Ranadive, DeepakVolume:
1593
Year:
1992
Language:
english
DOI:
10.1117/12.56911
File:
PDF, 742 KB
english, 1992