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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - A novel post exposure bake technique to improve CD uniformity over product wafers
Takeishi, Tomoyuki, Sturtevant, John L., Hayasaki, K., Shibata, TsuyoshiVolume:
5753
Year:
2005
Language:
english
DOI:
10.1117/12.599192
File:
PDF, 487 KB
english, 2005