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SPIE Proceedings [SPIE 21st European Mask and Lithography Conference - Dresden, Germany (Thursday 16 June 2005)] 21st European Mask and Lithography Conference - Mask manufacture for projection mask-less lithography (PML2): MEMS-technology for a programmable aperture plate system
Reimer, K., Witt, M., Kahler, D., Eichholz, J., Ratzmann, L., Brunger, W., Doring, H.-J,, Haugeneder, E., Eder-Kapl, S., Nowak, R.Volume:
5835
Year:
2005
Language:
english
DOI:
10.1117/12.637320
File:
PDF, 610 KB
english, 2005